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Measurement of stresses in Cu and Si around through-silicon via by synchrotron X-ray microdiffraction for 3-dimensional integrated circuits

✍ Scribed by A.S. Budiman; H.-A.-S. Shin; B.-J. Kim; S.-H. Hwang; H.-Y. Son; M.-S. Suh; Q.-H. Chung; K.-Y. Byun; N. Tamura; M. Kunz; Y.-C. Joo


Book ID
113800623
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
778 KB
Volume
52
Category
Article
ISSN
0026-2714

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