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Measurement of Si, SiF, and SiF[sub 2] radicals and SiF[sub 4] molecule using very high frequency capacitively coupled plasma employing SiF[sub 4]

✍ Scribed by Ohta, Takayuki; Hara, Ken-ichiro; Ishida, Tetsuro; Hori, Masaru; Goto, Toshio; Ito, Masafumi; Kawakami, Satoshi; Ishii, Nobuo


Book ID
120207996
Publisher
American Institute of Physics
Year
2003
Tongue
English
Weight
563 KB
Volume
94
Category
Article
ISSN
0021-8979

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