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Measurement of defect-mediated diffusion: The case of silicon self-diffusion

✍ Scribed by Ramakrishnan Vaidyanathan; Michael Y. L. Jung; Richard D. Braatz; E. G. Seebauer

Publisher
American Institute of Chemical Engineers
Year
2005
Tongue
English
Weight
95 KB
Volume
52
Category
Article
ISSN
0001-1541

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