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Maximum boron doping concentrations without oxygen incorporation for silicon molecular beam epitaxy using HBO2 and B2O3 as dopant sources

✍ Scribed by T.L. Lin; R.W. Fathauer; P.J. Grunthaner


Publisher
Elsevier Science
Year
1990
Tongue
English
Weight
226 KB
Volume
184
Category
Article
ISSN
0040-6090

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