Maximizing net light pressure on a chiral sculptured thin film by selection of the vapor incidence angle

✍ Scribed by Benjamin M. Ross; Akhlesh Lakhtakia

• Book ID: 102515727
• Publisher: John Wiley and Sons
• Year: 2007
• Tongue: English
• Weight: 259 KB
• Volume: 49
• Category: Article
• ISSN: 0895-2477
• DOI: 10.1002/mop.22407

✦ Synopsis

Abstract

The net light pressure on a chiral sculptured thin film, for normal incidence, can be maximized by appropriately choosing the vapor incidence angle during the fabrication of the film by physical vapor deposition. © 2007 Wiley Periodicals, Inc. Microwave Opt Technol Lett 49: 1407–1409, 2007; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/mop.22407