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Materials characteristics of pseudomorphic high electron mobility transistor structures with InxGa1−xas single quantum well and GaAs-InxGa1−xas (0.25 < x < 0.4) thin strained superlattice active layers

✍ Scribed by J. M. Ballingall; Pin Ho; P. A. Martin; G. J. Tessmer; T. H. Yu; N. Lewis; E. L. Hall


Book ID
112811894
Publisher
Springer US
Year
1990
Tongue
English
Weight
738 KB
Volume
19
Category
Article
ISSN
0361-5235

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