Materials and Processes for Next Generation Lithography

✍ Scribed by Alex Robinson and Richard Lawson (Eds.)

• Publisher: Elsevier
• Year: 2016
• Tongue: English
• Leaves: 614
• Series: Frontiers of Nanoscience 11
• Edition: 1
• Category: Library

✦ Synopsis

As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography.

These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches.

This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication.

• Assembles up-to-date information from the world’s premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation
• Includes information on processing and metrology techniques
• Brings together multiple approaches to litho pattern recording from academia and industry in one place

✦ Table of Contents

Content:
Frontiers of Nanoscience Page ii
Front Matter Page iii
Copyright Page iv
Contributors Pages xv-xvii
Preface Pages xix-xx Alex P.G. Robinson, Richard A. Lawson
Acknowledgments Page xxi Alex P.G. Robinson, Richard A. Lawson
List of abbreviations Pages xxiii-xxv
Chapter 1 - Overview of materials and processes for lithography Pages 1-90 Richard A. Lawson, Alex P.G. Robinson
Chapter 2 - Molecular excitation and relaxation of extreme ultraviolet lithography photoresists Pages 91-113 D. Frank Ogletree
Chapter 3 - Theory: Electron-induced chemistry Pages 115-133 Willem F. van Dorp
Chapter 4 - EUV lithography process challenges Pages 135-176 Elizabeth Buitrago, Tero S. Kulmala, Roberto Fallica, Yasin Ekinci
Chapter 5 - EUV lithography patterning challenges Pages 177-192 Patrick Naulleau
Chapter 6 - The chemistry and application of nonchemically amplified (non-CA) chain-scission resists Pages 193-210 Andrew K. Whittaker
Chapter 7 - Chemically amplified resists and acid amplifiers Pages 211-222 James W. Thackeray
Chapter 8 - Negative-tone organic molecular resists Pages 223-317 Richard A. Lawson, Andreas Frommhold, Dongxu Yang, Alex P.G. Robinson
Chapter 9 - Positive molecular resists Pages 319-348 Panagiotis Argitis, Veroniki P. Vidali, Dimitra Niakoula
Chapter 10 - Mainstreaming inorganic metal-oxide resists for high-resolution lithography Pages 349-375 Deirdre Olynick, Adam Schwartzberg, Douglas A. Keszler
Chapter 11 - Molecular organometallic resists for EUV (MORE) Pages 377-420 Brian Cardineau
Chapter 12 - SML electron beam resist: Ultra-high aspect ratio nanolithography Pages 421-446 Scott M. Lewis, Guy A. DeRose
Chapter 13 - Alternative resist approaches Pages 447-478 Alex P.G. Robinson, Richard A. Lawson
Chapter 14 - Next generation lithography—the rise of unconventional methods? Pages 479-495 Marcus Kaestner, Yana Krivoshapkina, Ivo W. Rangelow
Chapter 15 - Tip-based nanolithography methods and materials Pages 497-542 Yana Krivoshapkina, Marcus Kaestner, Ivo W. Rangelow
Chapter 16 - Thermal scanning probe lithography Pages 543-561 Philip C. Paul
Chapter 17 - Scanning helium ion beam lithography Pages 563-594 Xiaoqing Shi, Stuart A. Boden
Index Pages 595-608