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Mass spectrometry diagnostic of dc magnetron reactive sputtering

✍ Scribed by Snyders, R.; Gouttebaron, R.; Dauchot, J. P.; Hecq, M.

Book ID
118066776
Publisher
Royal Society of Chemistry
Year
2003
Tongue
English
Weight
229 KB
Volume
18
Category
Article
ISSN
0267-9477

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## Abstract Thin films of about 1ΞΌm Titanium Aluminum Nitride (TiAlN) were deposited onto mild steel substrates by reactive direct current (DC) magnetron sputtering using a target consisting of equal segments of titanium and aluminum. X‐ray diffraction (XRD) analysis showed that the TiAlN phase had