๐”– Bobbio Scriptorium
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Mass Spectrometric Studies of Molecular Ions in the Noble Gases

โœ Scribed by Hornbeck, John A.; Molnar, J. P.


Book ID
126780795
Publisher
The American Physical Society
Year
1951
Tongue
English
Weight
846 KB
Volume
84
Category
Article
ISSN
0031-899X

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Ion-etching of discharge-produced tetraf
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A~tract--Freshly deposited discharge-produced tetrafluoroethylene films were ion-etched with either helium, neon, argon, oxygen or hydrogen. The ions C +, CF +, CF~ and CF~ comprised most of the positive ions in rare gas discharges, with CF รท always dominant. Sputtered fragments containing two or mo