๐”– Bobbio Scriptorium
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Mass-spectrometric and spectroscopic studies of hydrogen discharge of an ion source

โœ Scribed by A. I. Nastyukha; A. R. Striganov; I. I. Afanas'ev; L. N. Mikhailov; M. N. Oganov


Book ID
112549177
Publisher
Springer US
Year
1961
Tongue
English
Weight
244 KB
Volume
8
Category
Article
ISSN
1573-8205

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Ion-etching of discharge-produced tetraf
โœ G. Smolinsky; M.J. Vasile ๐Ÿ“‚ Article ๐Ÿ“… 1979 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 449 KB

A~tract--Freshly deposited discharge-produced tetrafluoroethylene films were ion-etched with either helium, neon, argon, oxygen or hydrogen. The ions C +, CF +, CF~ and CF~ comprised most of the positive ions in rare gas discharges, with CF รท always dominant. Sputtered fragments containing two or mo