Mask contrast enhancement using beveled edge in X-ray lithography

✍ Scribed by Shinya Hasegawa; Junji Itoh; Nobufumi Atoda

• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 590 KB
• Volume: 9
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/0167-9317(89)90029-4