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Mapping of the Residual Voltage of Hall Devices Fabricated by P + Si Coimplantation on GaAs Wafers

✍ Scribed by Boháček, P. ;Krempaský, M. ;Korytár, D. ;Sekáčová, M. ;SenderáK, R.


Publisher
John Wiley and Sons
Year
1996
Tongue
English
Weight
607 KB
Volume
155
Category
Article
ISSN
0031-8965

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