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Mapping of the Nb–Ti–Si phase diagram using diffusion multiples

✍ Scribed by J.-C. Zhao; M.R. Jackson; L.A. Peluso

Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
478 KB
Volume
372
Category
Article
ISSN
0921-5093

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✦ Synopsis

A high-efficiency diffusion-multiple approach was employed to map the phase diagram of the Nb-Ti-Si ternary system, which is critical for the design of niobium silicide-based composites. These composites have high potential as a replacement for Ni-base superalloys for jet engine applications. Titanium is one of the most important elements for oxidation resistance and fracture toughness enhancement. Three isothermal sections of Nb-Ti-Si at 1000, 1150 and 1200 • C were constructed from the results obtained from diffusion multiples using scanning electron microscopy (SEM), electron probe microanalysis (EPMA), and electron backscatter diffraction (EBSD). Extremely high solubility of Nb in Ti 5 Si 4 (up to ∼46 at.% Nb at 1200 • C, substituting for Ti) was observed.

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