Magnetron sputtered Ti50Ni40Pt10 shape memory alloy thin films
β Scribed by Yongqing Fu; Hejun Du
- Book ID
- 110429264
- Publisher
- Springer
- Year
- 2003
- Tongue
- English
- Weight
- 270 KB
- Volume
- 22
- Category
- Article
- ISSN
- 0261-8028
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π SIMILAR VOLUMES
Ni-Mn-Ga thin films have been fabricated by using magnetron sputtering technique under various substrate negative bias voltages. The effect of substrate negative bias voltage on the compositions and surface morphology of Ni-Mn-Ga thin films was systematically investigated by energy dispersive X-ray
Since the transition temperature of the shape memory effect in Ni,Ti 1 ,. films depends on the composition of the layer, it is indispensable to have an accurate control on their composition. We are now able to control in situ the composition of r.f. sputtered Ni Ti films in the whole domain of shape