Magnetically enhanced reactive ion etching of silicon in bromine plasmas: Ahmed M El-Masry et al, J Vac Sci Technol, B6, 1988, 257–262

• Book ID: 103468554
• Publisher: Elsevier Science
• Year: 1989
• Tongue: English
• Weight: 148 KB
• Volume: 39
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/0042-207x(89)90535-6