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Magnetic properties of amorphous Fe‐Si thin films

✍ Scribed by Shimada, Yutaka; Kojima, Hiroshi

Book ID
111973164
Publisher
American Institute of Physics
Year
1976
Tongue
English
Weight
596 KB
Volume
47
Category
Article
ISSN
0021-8979

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## Abstract Fe–Si and Co–Si amorphous thin films with Si concentrations above their eutectic point were deposited by magnetron sputtering. The films had a well defined uniaxial magnetic anisotropy induced by evaporating the Si atoms at an oblique angle of incidence. Their anisotropy energy and coer