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Lower Temperature and Shorter Curing Time of Methylsilsesquioxane for Intermetal Dielectric Application

✍ Scribed by C. T. Chua; G. Sarkar; S. Y. M. Chooi; L. Chan


Book ID
110239368
Publisher
Springer
Year
1999
Tongue
English
Weight
61 KB
Volume
18
Category
Article
ISSN
0261-8028

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