Lower limit of detectability at high spatial resolution of As implanted into Si using the Jeol 200CX in the STEM-EDX mode

✍ Scribed by P. Renteln; D.G. Ast

• Publisher: Elsevier Science
• Year: 1988
• Tongue: English
• Weight: 864 KB
• Volume: 24
• Category: Article
• ISSN: 0304-3991
• DOI: 10.1016/0304-3991(88)90325-7