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Low-Temperature Thermal CVD of Ti–Al Metal Films Using a Strong Reducing Agent

✍ Scribed by Audunn Ludviksson; Matthew Nooney; Robert Bruno; Alec Bailey; Toivo T. Kodas; Mark J. Hampden-Smith


Publisher
John Wiley and Sons
Year
1998
Tongue
English
Weight
210 KB
Volume
4
Category
Article
ISSN
0948-1907

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