Investigation on powder metallurgy Cr–Si
✍
X.Y. Wang; Z.S. Zhang; T. Bai
📂
Article
📅
2010
🏛
Elsevier Science
⚖ 504 KB
The sputtering target for high-resistance thin film resistors plays a decisive role in temperature coefficient of resistance (TCR). Silicon-rich chromium (Cr)-silicon (Si) target was designed and smelted for high-resistance thin film resistors with low TCR. Valve metal tantalum (Ta) and aluminum (Al