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Low temperature rapid thermal low pressure chemical vapor deposition of 〈111〉 oriented TiN layers from the TiCl4NH3H2 gaseous phase

✍ Scribed by A. Bouteville; L. Imhoff; J.C. Remy


Book ID
114155700
Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
294 KB
Volume
37-38
Category
Article
ISSN
0167-9317

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