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Low temperature pulsed plasma deposition. Part I—a new technique for thin film deposition with complete gas dissociation

✍ Scribed by G. Scarsbrook; I.P. Llewellyn; S.M. Ojha; R.A. Heinecke


Publisher
Elsevier Science
Year
1988
Tongue
English
Weight
889 KB
Volume
38
Category
Article
ISSN
0042-207X

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