Low temperature poly-SixGe1−x deposited by reactive thermal CVD for thin film transistor application

✍ Scribed by J.J Zhang; K Shimizu; J Hanna

• Book ID: 117145658
• Publisher: Elsevier Science
• Year: 2002
• Tongue: English
• Weight: 149 KB
• Volume: 299-302
• Category: Article
• ISSN: 0022-3093
• DOI: 10.1016/s0022-3093(01)01196-6