Low-temperature in situ cleaning of silicon wafers with an ultra high vacuum compatible plasma source

✍ Scribed by J. Ramm; E. Beck; A. Züger; A. Dommann; R.E. Pixley

• Publisher: Elsevier Science
• Year: 1992
• Tongue: English
• Weight: 465 KB
• Volume: 222
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(92)90052-d