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Low temperature fast growth of nanocrystalline silicon films by rf-PECVD from SiH 4 /H 2 gases: microstructural characterization

✍ Scribed by Chen, Cheng-Zhao; Qiu, Sheng-Hua; Liu, Cui-Qing; Wu, Yan-Dan; Li, Ping; Yu, Chu-Ying; Lin, Xuan-ying


Book ID
118155123
Publisher
Institute of Physics
Year
2008
Tongue
English
Weight
724 KB
Volume
41
Category
Article
ISSN
0022-3727

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