๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Low temperature crystallization of a-Si thin film by nickel MOCVD

โœ Scribed by Sang-Joo Lee; Seung-Jae Yun; Se-Wan Son; Chang-Woo Byun; Seung-Ki Joo


Book ID
113514096
Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
406 KB
Volume
11
Category
Article
ISSN
1567-1739

No coin nor oath required. For personal study only.


๐Ÿ“œ SIMILAR VOLUMES


Microwave-induced low-temperature crysta
โœ Jin Hyung Ahn; Jeong No Lee; Yoon Chang Kim; Byung Tae Ahn ๐Ÿ“‚ Article ๐Ÿ“… 2002 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 158 KB

Microwave heating was utilized for low-temperature crystallization of amorphous Si (a-Si) films. Microwave heating lowered the annealing temperature and reduced the annealing time. By microwave heating the hydrogen in the amorphous films was diffused out long before the nucleation of polycrystalline

Low temperature growth of ZnO film by ph
โœ Masaru Shimizu; Hidenori Kamei; Motoaki Tanizawa; Tadashi Shiosaki; Akira Kawaba ๐Ÿ“‚ Article ๐Ÿ“… 1988 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 451 KB