Low-Temperature Atomic Layer Deposition of Copper Metal Thin Films: Self-Limiting Surface Reaction of Copper Dimethylamino-2-propoxide with Diethylzinc

✍ Scribed by Byoung H. Lee; Jae K. Hwang; Jae W. Nam; Song U. Lee; Jun T. Kim; Sang-M. Koo; A. Baunemann; Roland A. Fischer; Myung M. Sung

• Publisher: John Wiley and Sons
• Year: 2009
• Tongue: English
• Weight: 385 KB
• Volume: 48
• Category: Article
• ISSN: 0044-8249
• DOI: 10.1002/anie.200900414