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Low temperature amorphous silicon channel material for polysilicon thin film transistors

✍ Scribed by R.T Fulks; J Ho; J.B Boyce; G.A Davis; V Aebi

Book ID: 117150461
Publisher: Elsevier Science
Year: 2000
Tongue: English
Weight: 138 KB
Volume: 266-269
Category: Article
ISSN: 0022-3093
DOI: 10.1016/s0022-3093(99)00936-9

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