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Low stress PECVD—SiN x layers at high deposition rates using high power and high frequency for MEMS applications

✍ Scribed by Iliescu, Ciprian; Tay, Francis E H; Wei, Jiashen


Book ID
118131585
Publisher
Institute of Physics
Year
2006
Tongue
English
Weight
201 KB
Volume
16
Category
Article
ISSN
0960-1317

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