Low RF noise and power loss for ion-implanted Si having an improved implantation process

✍ Scribed by Chan, K.T.; Chin, A.; McAlister, S.P.; Chang, C.Y.; Liu, J.; Chien, S.C.; Duh, D.S.; Lin, W.J.

• Book ID: 120830509
• Publisher: IEEE
• Year: 2003
• Tongue: English
• Weight: 222 KB
• Volume: 24
• Category: Article
• ISSN: 0741-3106
• DOI: 10.1109/LED.2002.807027