✦ LIBER ✦
Low Resistance Al/Si Ohmic Contacts on Boron Implanted Shallow p + Si Layers Formed by Halogen Lamp Annealing
✍ Scribed by Hara, Tohru; Ohtsuka, Noboru; Enomoto, Syuichi; Hirayama, Takeshi; Amemiya, Kimio; Furukawa, Masakazu
- Book ID
- 125510519
- Publisher
- Institute of Pure and Applied Physics
- Year
- 1983
- Tongue
- English
- Weight
- 481 KB
- Volume
- 22
- Category
- Article
- ISSN
- 0021-4922
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