Low pressure chemical vapour deposition of silicon and germanium on silicon using contamination-minimized processing : N. Mikoshiba, J. Murota and A. Korhase. Vacuum41(4–6), 1087 (1990)

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 128 KB
• Volume: 31
• Category: Article
• ISSN: 0026-2714
• DOI: 10.1016/0026-2714(91)90158-4