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Low pressure chemical vapor deposition of niobium coating on silicon carbide

✍ Scribed by Qiaomu Liu; Litong Zhang; Laifei Cheng; Jinling Liu; Yiguang Wang

Publisher
Elsevier Science
Year
2009
Tongue
English
Weight
487 KB
Volume
255
Category
Article
ISSN
0169-4332

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## Abstract Amorphous silicon carbide (a‐SiC) films, deposited by plasma‐enhanced chemical vapor deposition (PECVD), have been evaluated as insulating coatings for implantable microelectrodes. The a‐SiC was deposited on platinum or iridium wire for measurement of electrical leakage through the coat