A square indicator using multilayer coplanar waveguide transmission lines on ( ) a GaAs fabricated by using monolithic microwave integrated circuits MMIC technology is presented. The polyimide layer formation, curing and dry etching processes are used in an attempt to obtain high quality dielectric
Low loss multilayer microstrip line for monolithic microwave integrated circuits applications
โ Scribed by Inder J. Bahl; Edward L. Griffin; John Dilley; Matt Balzan
- Publisher
- John Wiley and Sons
- Year
- 1998
- Tongue
- English
- Weight
- 384 KB
- Volume
- 8
- Category
- Article
- ISSN
- 1096-4290
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โฆ Synopsis
This paper describes the multilayer microstrip structure using low dielectric constant polyimide as a buffer layer between the microstrip conductor and the GaAs substrate to reduce dissipation loss, especially for very high impedance microstrip lines. The new structure provides about half the dissipation loss and about 40% higher characteristic impedance in comparison to the conventional microstrip line on GaAs substrate having the same conductor widths. An empirical formula for the equivalent dielectric constant compatible with commercial computer-aided design tools was developed to design monolithic ( ) microwave integrated circuits MMICs using this medium. The multilayer microstrip structure is compatible with ITT's 4ะ MSAG แฎ process which uses polyimide for crossovers and scratch protection. The present structure has great potential in realizing low loss and wideband matching networks including low noise, high power, and high efficiency amplifiers, and passive components on GaAs substrate with improved insertion loss and bandwidth performance, and three-dimensional MMICs.
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