✦ LIBER ✦
Low-impurity, highly conformal atomic layer deposition of titanium nitride using NH3–Ar–H2 plasma treatment for capacitor electrodes
✍ Scribed by Yong Ju Lee
- Book ID
- 113788530
- Publisher
- Elsevier Science
- Year
- 2005
- Tongue
- English
- Weight
- 237 KB
- Volume
- 59
- Category
- Article
- ISSN
- 0167-577X
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