Low energy electron induced X-ray emission spectrometry (LEXES) and secondary ion mass spectrometry (SIMS) sensitivity studies to ultra shallow arsenic implants

✍ Scribed by H. Graoui; G. Conti; M. Hilkene; B. McComb; A. Tjandra; M.A. Foad; D. Kouzminov; J. Hunter; C.J. Hitzman; C.A. Evans

• Publisher: Elsevier Science
• Year: 2005
• Tongue: English
• Weight: 211 KB
• Volume: 237
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/j.nimb.2005.05.010