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Low energy ECR plasma etching with a hybrid magnetic field

✍ Scribed by N. Fujiwara; K. Nishioka; T. Kato

Book ID: 103598195
Publisher: Elsevier Science
Year: 1990
Tongue: English
Weight: 295 KB
Volume: 11
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(90)90176-t

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