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Low contact resistance metals for graphene based devices

✍ Scribed by Watanabe, Eiichiro; Conwill, Arolyn; Tsuya, Daiju; Koide, Yasuo


Book ID
121365776
Publisher
Elsevier Science
Year
2012
Tongue
English
Weight
663 KB
Volume
24
Category
Article
ISSN
0925-9635

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A new pulsed nucleation tungsten process, called ''PNL low-R s W'', has been developed that results in near-bulk resistivity even in ultra-thin tungsten films. This solution greatly diminishes the need to develop alternative films for contact fill, probably for several generations. The process is do