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Long-term effects of injected electrons in tunnel oxide on the electrical characteristics of Al gate/thin oxide/Si structures—Relatively low oxide field case

✍ Scribed by Nagai, K.; Hayashi, Y.


Book ID
114594440
Publisher
IEEE
Year
1983
Tongue
English
Weight
328 KB
Volume
30
Category
Article
ISSN
0018-9383

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