Local structural modifications of the HfO2 layer in the Al2O3 capped high-k dielectric films as probed by EXAFS

✍ Scribed by Sahiner, M. A. ;Lysaght, P. S. ;Woicik, J. C. ;Park, C. S. ;Huang, J. ;Bersuker, G. ;Taylor, W. ;Kirsch, P. D. ;Jammy, R.

• Book ID: 112180900
• Publisher: John Wiley and Sons
• Year: 2012
• Tongue: English
• Weight: 210 KB
• Volume: 209
• Category: Article
• ISSN: 0031-8965
• DOI: 10.1002/pssa.201100669