✦ LIBER ✦

Local-field corrections to the static dielectric function of semiconductors: A model study

✍ Scribed by Ami Chand Sharma; Sushil Auluck

Publisher: Elsevier Science
Year: 1983
Tongue: English
Weight: 260 KB
Volume: 96
Category: Article
ISSN: 0375-9601
DOI: 10.1016/0375-9601(83)90347-x

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Quasi-static pulsed high magnetic field

Quasi-static pulsed high magnetic field used to study magnetic properties of semimagnetic semiconductors

✍ J.P. Lascaray; A. Bruno; J.C. Ousset; H. Rakoto; J.M. Broto; S. Askenazy 📂 Article 📅 1989 🏛 Elsevier Science 🌐 English ⚖ 289 KB

A method of local corrections for comput

A method of local corrections for computing the velocity field due to a distribution of vortex blobs

✍ Christopher R Anderson 📂 Article 📅 1986 🏛 Elsevier Science 🌐 English ⚖ 738 KB

Correction to “the compressed geomagneti

Correction to “the compressed geomagnetic field as a function of dipole tilt”

✍ D.W. Halderson; D.B. Beard; J.Y. Choe 📂 Article 📅 1975 🏛 Elsevier Science 🌐 English ⚖ 303 KB

First order corrections to the wave func

First order corrections to the wave function of a hydrogen atom in an external electromagnetic field: A sturmian expansion

✍ A. Maquet; P. Martin; V. Véniard 📂 Article 📅 1988 🏛 Elsevier Science 🌐 English ⚖ 204 KB

A correction to the calculation of the s

A correction to the calculation of the semiconductor work function and its implication for the effective density of charges

📂 Article 📅 1974 🏛 Elsevier Science 🌐 English ⚖ 185 KB

A model for assessing occupational expos

A model for assessing occupational exposure to extremely low-frequency magnetic fields in fabrication rooms in the semiconductor health study

✍ Sassan Abdollahzadeh; S. Hammond Katharine; Marc B. Schenker 📂 Article 📅 2010 🏛 John Wiley and Sons 🌐 English ⚖ 760 KB

A model was created to assess occupational exposure to extremely low-frequency magnetic fields (ELF-MF) among semiconductor fabrication-room (fab) workers. This model was based on the assumption that each subject's exposure arose from being near identifiable ELF-MF sources or being in areas with hig