✦ LIBER ✦
Lithographic Properties of Poly( tert -butyl methacrylate)-Based Block and Random Copolymer Resists Designed for 193 nm Wavelength Exposure Tools
✍ Scribed by Gabor, Allen H.; Pruette, Laura C.; Ober, Christopher K.
- Book ID
- 127005367
- Publisher
- American Chemical Society
- Year
- 1996
- Tongue
- English
- Weight
- 367 KB
- Volume
- 8
- Category
- Article
- ISSN
- 0897-4756
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