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Lateral diffusion of dopants in a 1 μm N+/P+ polycide gate CMOS process

✍ Scribed by D. Lévy; D.T. Amm; G. Göltz; J. Torrès; P. Delpech; T. Ternisien D'Ouville; H. Mingam; R. Stuck


Publisher
Elsevier Science
Year
1989
Tongue
English
Weight
417 KB
Volume
38
Category
Article
ISSN
0169-4332

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