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Lateral deposition of polypyrrole lines by means of the scanning electrochemical microscope

✍ Scribed by Christine Kranz; Markus Ludwig; Prof. Herrmann E. Gaub; Dr. Wolfgang Schuhmann


Publisher
John Wiley and Sons
Year
1995
Tongue
English
Weight
424 KB
Volume
7
Category
Article
ISSN
0935-9648

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The lithographic effect of electron beam in line exposures in scanning electron micruicopy (SEM) on poly(methy1 methacrylate) (PMMA) was evaluated using the line width in a film deposited on a silicium substrate and from the line profiles in a PMMA plate. It was found that the effect of the dose on