Laser-Induced Damage of Optical Materials (Series in Optics and Optoelectronics)
โ Scribed by Roger M. Wood
- Publisher
- Taylor & Francis
- Year
- 2003
- Tongue
- English
- Leaves
- 252
- Edition
- 1
- Category
- Library
No coin nor oath required. For personal study only.
โฆ Synopsis
The laser power handling capacities of optical systems are determined by the physical properties of their component materials. At low intensity levels these factors are not important, but an understanding of damage mechanisms is fundamental to good design of laser products operating at high power. Laser Induced Damage of Optical Materials presents a comprehensive overview of the damage processes that occur at high laser intensity levels and explains how these factors limit the energy handling capabilities of optical systems.The first two chapters of the book review basic EM theory, and consider optical effects, including absorption and scattering processes, that occur at low and medium energy levels. Chapter 3 describes the damage mechanisms that come into effect when intensity levels are raised. Chapter 4 discusses the central theory for the definition and measurement of the laser-induced damage thresholds of optical materials. This covers both thermal damage and dielectric breakdown as a function of absorption and laser pulse length and spot size. The following chapters are devoted to surfaces and sub-surface damage, coatings, measurement techniques, and special topics such as scaling and the importance of using the correct measurement unit systems.Laser Induced Damage of Optical Materials is an invaluable resource to those working with optical systems where high laser intensity is a factor.
โฆ Table of Contents
Contents......Page 5
Preface......Page 9
1. Introduction......Page 11
2. Optical effects at low power/energy levels......Page 17
3. Optical effects at medium power/energy levels......Page 51
4. Damage theory......Page 64
5. Surfaces and sub-surfaces......Page 120
6. Coatings......Page 147
7. Special topics......Page 167
8. Measurement techniques......Page 187
Appendix 1......Page 225
Appendix 2......Page 227
Appendix 3......Page 228
Appendix 4......Page 229
Appendix 5......Page 231
Appendix 6......Page 234
Appendix 7......Page 236
Appendix 8......Page 237
Appendix 9......Page 238
Appendix 10......Page 239
Appendix 11......Page 240
References......Page 242
Index......Page 249
๐ SIMILAR VOLUMES
This new edition of Fynn and Powell's highly successful The Cutting and Polishing of Electro-Optic Materials will serve as a practical 'hands on' guide to the machining of precision optical surfaces on optical and electronic materials. Clearly based on the sound experience and skills of the authors,
Liquid-Phase Epitaxy (LPE) is a technique used in the bulk growth of crystals, typically in semiconductor manufacturing, whereby the crystal is grown from a rich solution of the semiconductor onto a substrate in layers, each of which is formed by supersaturation or cooling. At least 50% of growth in