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Laser fabrication of high-aspect-ratio holes and grooves in photoresist by time constant manipulation

✍ Scribed by C. Egami; Y. Liu


Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
419 KB
Volume
280
Category
Article
ISSN
0030-4018

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✦ Synopsis


We report on the cw-laser fabrication of sharp-edged holes and grooves in organic-dye-sensitized photoresists for g-line or i-line by manipulating its intensity and scanning rate. The laser fabrication is performed to locally control the reaction time constant of the photoresist. By scanning a tightly focused laser focal spot inside the transparent photoresist, various micron/submicron meter structures have been produced based on the reaction time constant depending on the beam intensity. The proposed method is considered to be a costeffective technique for high-aspect-ratio holes and grooves fabrication.