Large, quiescent, magnetized plasma for wave studies
- Publisher
- Elsevier Science
- Year
- 1976
- Tongue
- English
- Weight
- 137 KB
- Volume
- 26
- Category
- Article
- ISSN
- 0042-207X
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β¦ Synopsis
The advantages of ion etching over wet chemical etching are demonstrated, e,g. structure resolution in the region of the etching depth, no undercutting, excellent reproducibility and high adherence of small striplines.
π SIMILAR VOLUMES
A method for obtaining numerical solutions of the nonlinear eigenvalue problem c(e) e-X~><(v Xe)=O is described. The nonlinearity is due to the ponderomotive force exerted by the wave on a plasma, which modifies the densities. A centred finite-difference scheme is used, which avoids spectra pollutio
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