Large area SiH4/H2 VHF plasma produced at high pressure using multi-rod electrode
✍ Scribed by Yasuhiro Yamauchi; Yoshiaki Takeuchi; Hiromu Takatsuka; Yuichi Kai; Hiroshi Muta; Yoshinobu Kawai
- Book ID
- 104094330
- Publisher
- Elsevier Science
- Year
- 2008
- Tongue
- English
- Weight
- 521 KB
- Volume
- 202
- Category
- Article
- ISSN
- 0257-8972
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✦ Synopsis
A VHF SiH 4 /H 2 plasma was produced using a multi-rod electrode of 1200 mm × 115 mm and the characteristics of VHF plasma at high pressure were measured with a heated Langmuir probe, where the frequency of VHF power source was 60 MHz and the power was up to 450 W. The pressure was ranged from 1 Torr to 3 Torr. When the pressure was increased, the ion saturation current density decreased independent of the concentration ratio of SiH 4 /H 2 and the electron temperature tended to increase at high pressures. Furthermore, when the VHF power was increased, the wall potential decreased at high pressures.