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Langmuir Probe Characterization of a RF Discharge Excited in Ar/C2F3Cl Mixtures during Plasma Deposition Processes

✍ Scribed by P. Špatenka; M. Šícha


Publisher
John Wiley and Sons
Year
1989
Tongue
English
Weight
529 KB
Volume
29
Category
Article
ISSN
0005-8025

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