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Kinetics and Mechanism of the Thermal Decomposition of Si3N4

โœ Scribed by H. DEAN BATHA; E. DOW WHITNEY

Book ID
110813751
Publisher
John Wiley and Sons
Year
1973
Tongue
English
Weight
570 KB
Volume
56
Category
Article
ISSN
0002-7820

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The kinetics and mechanism of the thermal decomposition of n-propylsilane have been studied by the single pulse shock tube-comparative rate technique a t pressures around 4700 torr between 1095-1240 K. The primary dissociation processes are 1,l and 1,2 H, elimination with &,,, = 0.75 and &,,\* = 0.2